Photoresist processing
with μLAB and μCHEM

Photoresist processing is a process-critical component of semiconductor manufacturing and is key to the precise definition of micro- and nanostructured wafers. As demands on resolution, process window, and reproducibility increase, stable and tightly controlled wet-chemical process steps are increasingly coming into focus.

The μCHEM and μLAB systems are designed for precise and reproducible photoresist processing across the entire wet-chemical process chain. They support coating, developing, etching, and cleaning of photoresist layers under tightly controlled conditions and are designed for flexible adaptation to varying process requirements in development and production.

Typical applications include wet-chemical photoresist processes in semiconductor manufacturing, wafer patterning for MEMS and sensor systems, and development and qualification processes for new photoresists. In addition, the systems enable implementation of customer-specific process flows with well-defined and stable process windows.