Innovative etching technology
for precise wafer processes

Etching processes are a central element of semiconductor manufacturing and are crucial for the precise definition of complex structures on wafer surfaces. The high demands on structural fidelity, reproducibility, and process stability require high-performance etching systems with tightly controlled process parameters.

We develop customized etching solutions for demanding applications in development and production. The systems are designed for the use of high-purity etching chemicals and precise, stable process control, ensuring high consistency – both in high-volume manufacturing and in specialized, application-specific processes.

The portfolio includes automated etching systems and modular system concepts that can be seamlessly integrated into existing manufacturing environments. Typical applications range from customer-specific etching processes with tight process windows and the structuring of semiconductor wafers to etching processes for MEMS and sensor systems, as well as precision etching for micro- and nanostructured components.