µGALV-P
High-precision panel plating

The µGALV-P is a state-of-the-art system for electrochemical surface plating and was developed specifically for applications in MEMS, semiconductors, optics, and solar technology. Thanks to its flexible system concept and adaptable process control, it is suitable for both industrial production environments and research and development applications.

The system supports panel sizes up to Gen 5.1 and enables precise and reproducible plating under stable process conditions. At the same time, processes can be specifically accelerated and flexibly adapted to different production requirements.

In our modern application lab in Germany, we analyze and optimize coating processes, test different system configurations, and support you in selecting suitable chemicals and process parameters.

This results in a solution that integrates seamlessly into your production and development environment and ensures stable, repeatable results.

Datasheet
Panel plating system: µGalv-P

Panel sizes: Min. 300 x 300 mm² up to Gen 5.1
Applications: Optical, RDL packaging

Overflow process with process cell and reserve tank with filtration circuit
Customizable chamber amount
Electroplating deposition of metals: Ni, Cu, Au, NiFe, SnPb, and more
Etching / developing / stripping
Process cells can be configured as a rack plater
Pulse and reverse-pulse plating with a minimum pulse time of 0.1 ms; optional complex waveforms such as sinus, triangle, etc.

Standard: Overflow rinse
Optional: Quick Dump Rinsing (QDR)

Material: Polypro white
Pump: Centrifugal pump made of PP, optional PVDF or PTFE
Filter: PP filter, optional PVDF/PFA
Piping: PP piping, optional PVDF or PFA hoses with PFA Flaretek® tube fittings
Operator interface (HMI): IPC with keyboard/monitor and PLC control
Available in Pro and R&D+ versions

Automatic handling (semi-automatic, dry-in and dry-out)
Integration of pre- and post-processing cells possible (= etching and wetting cells available)
Integration of laminar flow units
Etching and wetting cells available (= integration of pre- and post-processing cells possible)
FM 4910-compliant material optionally available