Spin Rinse Dryer μSRD
For the highest standards in wafer cleaning

The Spin Rinse Dryer μSRD delivers precise wafer cleaning and reliable drying in batch processes. Its user-friendly design enables simple and efficient operation. After loading a single wafer cassette into the stainless steel rotor, the system automatically takes over the entire cleaning and drying process.

Manufactured from chemically resistant polypropylene or stainless steel, the μSRD offers high resistance to acids and alkalis and is designed for long-lasting, stable operation.

The integrated software is operated via an intuitive touchscreen interface and provides more than ten programs for different wafer types and process requirements. Preconfigured process parameters enable a fast and reliable production start while allowing flexible adaptation to individual applications.

The μSRD ensures stable and reproducible processes while meeting stringent purity and particle cleanliness requirements. Efficient use of media and energy helps reduce operating costs, while intuitive operation and low maintenance requirements support high system availability.

In this way, the Spin Rinse Dryer μSRD combines advanced process control with high user-friendliness, ensuring reliable process conditions for applications in both research and production.

Data sheet
Spin Rinse Dryer μSRD

Single system or stand alone (double stack)
Wafer sizes: Up to 300 mm
Applications: Rinsing and drying of wafer baskets

Processing of wafer carriers (25 wafers)
High- and low-profile carriers
Simple programming
Balanced rotor with cassettes
Electropolished chamber and rotor
Easy rotor replacement

Ionization
DI water reclaim
DI water heating system
Tool-free replaceable plastic inserts (wafer carrier, included with every version)
Suitable for different wafer sizes
Resistivity monitoring
Stainless steel version

Material: White Polypro, stainless steel
Door material: White Polypro, transparent PVC