μCHEM and μLAB
Photoresist Processing

Photoresist processing is a fundamental step in semiconductor manufacturing, enabling the creation of complex structures on substrates. The process includes coating, exposure, development, etching, and cleaning of photoresist layers to produce precise structures on wafers. As demands on structural resolution and reproducibility increase, stable and efficient photoresist processing becomes essential.

With the μCHEM and μLAB systems, we provide solutions for all wet-chemical process steps in photoresist processing. The systems are designed for precise and stable process control and can be used in both development and qualification as well as in series production.

Thanks to their modular design, the systems can be adapted to different process requirements in research, pilot production, and manufacturing. This enables stable and reproducible photoresist processing on a scalable platform.