μPORSI
Electropolishing of Silicon

Our μPORSI system offers a complete solution for the production and electropolishing of porous silicon. This advanced system is perfectly suited for demanding applications in the LED, photovoltaic, and semiconductor industries.

The system covers the complete production process, including drying, and is specifically designed for the requirements of porous silicon production. If desired, we also provide on-site support for commissioning and process integration.

Since process requirements vary depending on the application, the μPORSI system is based on a modular and flexible architecture. This enables precise adaptation to existing production environments and application-specific process parameters. The system is suitable for both research and development projects and industrial series production, providing a scalable platform for a broad range of applications.

Datasheet
Porous Silicon Unit µPORSI

Wafer sizes: Up to 300 mm
Applications: MEMS, CMOS, sensors, photovoltaics, R&D or production applications

Overflow circulation
Customized chamber configuration
PLC-controlled

Standard: Overflow rinse
Optional: Quick Dump Rinse (QDR), Pentane, IPA

Material: White polypropylene
Piping: PP, optional PVDF or PFA with PFA Flaretek® tube fittings
Operating interface: Touch panel

All process controls are integrated into the front panel.
All electrical and pneumatic components are integrated in a separate compartment in
the rear service area.
DIW and N2 spray guns are integrated into the work surface.